深潮TechFlow
深潮TechFlow|9月 08, 2026 06:36
[ASML Advances Next-Generation Lithography Machine Upgrades, Targeting Large Data Center Chip Market] Deep Tide TechFlow reports that on September 8, ASML announced plans to collaborate with its key clients to develop new solutions capable of producing the most advanced chip manufacturing equipment to meet the demand for large data center chips designed by companies like NVIDIA. Currently, ASML's widely used extreme ultraviolet (EUV) lithography machines can manufacture chips with a maximum area of approximately 800 square millimeters. The next-generation 'High-NA' EUV lithography machines that ASML is set to launch will enable the production of even more intricate chips. However, due to their use of smaller-sized masks, they are currently limited in the chip area they can produce. ASML plans to demonstrate a trial production line using larger-sized masks by 2031 and aims to enable large-scale production with this new technology by 2033. (Jin10)
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