[Samsung Electronics Unveils Next-Generation Lithography Technology Roadmap, Plans to Deploy High NA EUV in Mass Production at the 1nm Node] BlockBeats News, August 11: Samsung Electronics' technical expert Park Chang-min announced at the 2026 NGL conference that Samsung Electronics plans to introduce a major innovation in lithography technology for its 1nm process, which could enter mass production as early as 2030. The company intends to deploy High NA EUV, a next-generation extreme ultraviolet lithography technology, in mass production at the 1nm node and is currently focused on developing the necessary technologies for commercialization. Additionally, Samsung Electronics is strengthening the development of High NA EUV, which represents the next generation of EUV technology. The company has set the 1nm (or A10) process as its goal for full deployment in mass production. "A" refers to angstrom, where 1 angstrom equals 0.1nm. According to this roadmap, Samsung Electronics expects to begin using High NA EUV in mass production around 2030. The company has already commercialized its 2nm process and plans to start mass production of its 1.4nm SF1.4 process in 2029. Reports indicate that it is preparing to begin mass production of SF1.4+ (an enhanced version of the 1.4nm process) and its 1nm process in 2030.