[Musk May Use FEL Technology to Challenge EUV Lithography Machines] BlockBeats News, August 10: SpaceX recently announced a collaboration with Tesla, with an initial investment of $16.8 billion to establish a Terafab chip facility in Texas, USA. A blogger revealed that based on information released by Terafab, Musk appears to be adopting the "Free Electron Laser" (FEL) technology route to challenge ASML's LPP EUV light source, aiming to disrupt the monopoly of traditional EUV chip production technology. Musk's subsequent response seems to confirm this speculation, as he posted the phrase "FEL FTW" (FEL For The Win). From Terafab's elongated factory design and Musk's reply, it can be inferred that Terafab is highly likely to adopt FEL technology. Although the idea of Musk pursuing FEL is still speculative, it has sparked heated discussions among industry professionals. FEL boasts advantages such as high power, high coherence, tunable wavelengths, and greater energy efficiency. Theoretically, it could push lithography light sources from 13.5nm to 6nm or even shorter wavelengths. However, the massive accelerator system, costs, and production stability remain the biggest challenges for industrialization. (Source: Hong Kong Economic Journal)