[Russia Develops 150nm Lithography Machine with Performance Comparable to Pentium 4 from 20 Years Ago] Golden Finance reports that on July 22, according to Fast Technology, the Russian Green City Nanotechnology Center (ZNTC) has successfully developed a prototype of an electron beam lithography machine (ELL) with a design standard of 150 nanometers. This project is part of a key research and development task under the framework of Russia's National Science and Technology Development Plan, codenamed Progress ELL 150. The device is primarily used for manufacturing photomasks and can also directly draw circuit patterns on substrates without using masks. The 150nm process roughly corresponds to the performance level of Intel's Pentium 4 from 20 years ago. In 2025, ZNTC had demonstrated similar equipment with a resolution of 350 nanometers and has since advanced to 90nm and 130nm technology nodes. Industry experts point out that such equipment is only suitable for small-scale production of specialized chips in fields like aerospace and defense.